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H2020Individual fellowship2015–2017

NanoLAPS · NANOSTRUCTURED LARGE AREA PLASMONIC SYSTEMS DEPOSITED BY GAS FLOW SPUTTERING AND PLASMA-ENHANCED CVD PROCESSES

Horizon 2020 — Marie Skłodowska-Curie Actions

Duration
2015-04-01 → 2017-06-29
EU contribution
€159,461
Participants
1
Scheme
MSCA-IF-EF-ST

Lines connect the coordinator with its partners.

Results in brief

NANOSTRUCTURED LARGE AREA PLASMONIC SYSTEMSDEPOSITED BY GAS FLOW SPUTTERING AND PLASMA-ENHANCED CVD PROCESSES

Nano-LAPS project aims at the deposition of high purity nanocomposite thin films with demonstrated optical properties (plasmonic absorption peak) using a novel equipment for the large-scale deposition of nanoparticles generated by Gas Aggregation process. This approach is based on a unique and original experimental setup combining gas flow sputtering and Plasma-Enhanced CVD processes. While techniques such as lithography or wet chemistry have their specific advantages, they are clearly limited either by their costs, by their speed or by the size of the deposited structures. The Gas aggregation process is an economically viable approach to generate high-purity nanoparticles and nanocomposite films on a wide area and with a very high deposition rate. While this process has a great potential, it needs to be developed, both improving process stability and reproducibility. Applications of plasmonics are to be found in non-linear optics, waveguides, photonics and various new fields of nanoscience such as Nano-magneto-optics.

Data: CORDIS, © European Union

Project objective

Nanocomposites made of metallic nanoparticles (e.g. Au, Ag, Cu) embedded in a transparent matrix may display unique optical properties due to plasmonic effects resulting from the interaction of light with particles of nanometric size. This original behavior can be exploited in a wide range of applications including chemical and bio-sensors with extremely high sensitivity, spectroscopy, solar energy harvesting, and nanophotonics.In this context, Nano-LAPS project aims at the deposition of high purity nanocomposite materials with well controlled plasmonic absorption peak in the visible or infra-red ranges. Objectives are based on the encouraging results of preliminary work realized on this subject at FhG, which establishes a solid starting point for this project. The chosen approach is based on a unique and original deposition method combining gas flow sputtering and Plasma-Enhanced CVD processes. This technology allows coating large area substrates, with the highest purity, for a wide choice of nanoparticles (Au, Ag, Cu, Al, W, and high performance conductive oxides) and matrices (SiOxCy, TiOxCy, plasma polymers).The host organization senior researchers and management have an established reputation in research on thin films and nanotechnology, and are highly qualified to lead and to support this project, providing the best conditions for its success. Besides, the researcher has proved his capacity in leading and structuring scientific works on thin films coatings and processdesign. His experience will complement that of the host organization with new and original topics likely to draw scientific attention and open up perspectives for this research work.

Original text from CORDIS.

Participants

  • FRAUNHOFER GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG EV · MunchenCoordinatorGermany

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Data: CORDIS, © European Union