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HEStaff exchange2023–2026

L4DNANO · Laser Interference Lithography based 4D-printing of Nanomaterials

Horizon Europe — Marie Skłodowska-Curie Actions

Duration
2023-01-01 → 2026-12-31
EU contribution
€630,200
Participants
19
Scheme
HORIZON-TMA-MSCA-SE

Lines connect the coordinator with its partners.

Results in brief

Laser Interference Lithography based 4D-printing of Nanomaterials

Since its introduction nearly four decades ago, 3D printing has taken the world by storm. As the technology has advanced, the types of materials that can be printed have expanded to include smart materials, particularly smart nanomaterials, giving rise to 4D nanomaterials that can change shape and properties over time in response to inputs such as light or heat. However, existing technologies for 3D-printing at the nanoscale have limitations in simultaneously achieving high-accuracy and high-throughput in large volume nanostructures fabrication. L4DNANO aims to overcome these limitations by initiating a new process paradigm of laser interference lithography (LIL) based 4D-printing for rapidly and accurately producing truly 3D structural and large volume 4D nanomaterials. This is achieved through 4 overall objectives: (1) realising volumetric LIL scanning and deep exposure in photosensitive materials, (2) achieving optimal stitching, leading the seamless accumulation of 3D nanostructural patterns, (3) achieving controlled infiltration of smart materials to the 3D nanostructural templates for producing 4D nanomaterials, (4) pioneering LIL-based 4D-printing with biomedical and engineering applications. The new techniques will be pioneered on biomedicine and engineering applications. The objectives are ambitious and require international level collaborations. The project addresses the collaborations by initiating a long-term collaboration platform among consortium members and beyond. It also emphasis staff development via various joint research and innovation and training activities, particularly, the carefully arranged secondments.

Data: CORDIS, © European Union

Project objective

By tackling the limitations of the current 4D-printing of nanomaterials, this project seeks to initiate a new process paradigm, laser interference lithograph (LIL) based 4D-printing, for rapidly and accurately producing truly 3D structural and large volume 4D nanomaterials. It achieves this by combining the advantages of laser interference lithograph with the advanced intelligent inks, producing state-of-the-art capacity of 4D nanomaterials manufacturing. This new method has the potential to the mass-production of 4D nanomaterials and to the market intake of the nanomaterials. In our approach, LIL patterning is applied and the patterns are stitched to form truly 3D nanostructures and then the infiltration of intelligent inks is performed. The approach is based on some established principles and prior art gained within the consortium but is yet to be further explored.The project creates new knowledge on LIL and metalens for 3D patterning and nanometrology, bioactivity-toxicity of 4D Nanomaterials and micro-structures influence to battery performance/life.The research and innovation objectives are to integrate volumetric laser interference lithograph scanning and deep exposure for rapid, accurate, truly 3D structures fabrication, to develop optimal alignment between interference pattern units and across patterned layers based on the state-of-the-art nanometrology and characterisation for accurate formation of large volume 3D nanostructures, and to accomplish controlled infiltration for the formation the 4th dimension of nanomaterials. The new technique will be pioneered on biomedicine and engineering applications. The objectives are ambitious and require international level collaborations. The project addresses the collaborations by initiating a long-term collaboration platform among consortium members and beyond. It also emphasis staff development via various joint research and innovation and training activities, particularly, the carefully arranged secondments.

Original text from CORDIS.

Participants

  • AARHUS UNIVERSITET · Aarhus CCoordinatorDenmark
  • ASOCIACION CENTRO TECNOLOGICO CEIT · SAN SEBASTIANSpain
  • Changchun University of Science and Technology · ChangchunChina
  • DANMARKS TEKNISKE UNIVERSITET · Kongens LyngbyDenmark
  • DANSK FUNDAMENTAL METROLOGI AS · HORSHOLMDenmark
  • EIDGENOESSISCHE TECHNISCHE HOCHSCHULE ZUERICH · ZuerichSwitzerland
  • ELEMENTS SRL · CesenaItaly
  • EMORY UNIVERSITY NON PROFIT CORP · AtlantaUnited States
  • KARLSRUHER INSTITUT FUER TECHNOLOGIE · KarlsruheGermany
  • MONASH UNIVERSITY · VictoriaAustralia
  • NATIONAL CENTER FOR NANOSCIENCE AND TECHNOLOGY · BEIJINGChina
  • NATIONAL TAIWAN UNIVERSITY · TaipeiTaiwan
  • NORTHWESTERN UNIVERSITY CORPORATION · EVANSTONUnited States
  • THE REGENTS OF THE UNIVERSITY OF CALIFORNIA · OaklandUnited States
  • TOKAI NATIONAL HIGHER EDUCATION ANDRESEARCH SYSTEM, NATIONAL UNIVERSITY CORPORATION · NagoyaJapan
  • Tianjin University · TianjinChina
  • UNIVERSIDADE FEDERAL DE SAO PAULO · Sao PauloBrazil
  • UNIVERSITY OF BEDFORDSHIRE · LutonUnited Kingdom
  • UNIVERSITY OF WARWICK · COVENTRYUnited Kingdom

Links

Data: CORDIS, © European Union