FP5Individual fellowship2001–2003
Expanding thermal plasma deposition of silicon dioxide films for microelectronic devices.
FP5 — Improving Human Research Potential
- Duration
- 2001-08-01 → 2003-07-31
- EU contribution
- €140,800
- Participants
- 1
- Scheme
- RGI
Lines connect the coordinator with its partners.
Participants
- EINDHOVEN UNIVERSITY OF TECHNOLOGY · EINDHOVENCoordinatorNetherlands
Links
Data: CORDIS, © European Union