FP6Individual fellowship2004–2005

HWCVD · Hot-Wire Chemical Vapor Deposition - Education of skills and cross fertilization

FP6 — Marie Curie Actions (Human Resources and Mobility)

Duration
2004-03-01 → 2005-02-28
EU contribution
€49,450
Participants
1
Scheme
EIF

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Results in brief

Final Activity Report Summary - HWCVD (Hot-wire chemical vapour deposition - education of skills and cross fertilisation)

'In hot-wire chemical vapour deposition' (Catalytic CVD), surface reactions and thin film formation are governed by reactions between chemical radicals only. There is no risk of damage to sensitive electronic layers due to the impact of energetic ions. The efficient hydrogen removal from the growing surface, along with an effective network relaxation, leads to semiconductor and dielectric layers with low defect densities and high electronic quality at deposition rates that are unequalled by conventional deposition methods. At the end of August, 160 scientists from 30 countries gathered at Utrecht University to exchange the latest news on processes and applications involving Hot-Wire CVD. HWCVD gives approaches to many challenging issues that are encountered along the path dictated by Moore's law for the density of circuits on a chip, such as: high reliability of thin dielectric layers, better step coverage, avoidance of plasma damage to low-k material, and independence of the type of underlying layers [Y. Akasaka, Osaka Univ.]. HWCVD can also be used to produce very large area devices, such as displays with thin film transistor active matrices and thin film solar cells. It has now been proven that solar cells, made with a microcrystalline silicon layer, are totally stable for more than 5000 hours of light exposure [J. Andreu, Univ. Barcelona]. Since the process of HWCVD is independent of the shape of the object to be coated, both on a macroscopic scale as well as on a nanoscopic scale, many odd-shaped objects can be conformally coated. The technology can create hard, impenetrable coatings on tools, biopassive coatings on implantable medical devices, and it can provide surface modifications, e.g., to impart water resistance to fabric and paper [K. Gleason, MIT, Cambridge].We have witnessed groundbreaking developments and numerous innovations in the use of HWCVD for the synthesis of carbon nanotubes [J.M. Bonard, Rolex S.A., Geneva; and A.M. Bonnot, LEPES-CNRS, Grenoble]. Within the family of nanotubes, single wall carbon nanotubes (SWNT) are the most promising material to bridge the gap between nanoelectronics and the emerging field of molecular electronics. Hot-Wire CVD can offer a self-assembling process which allows to anchor and in situ wire SWNTs at predetermined places by patterning a thin catalyst cobalt film. The European Commission has supported this Conference by means of travel and participation grants for young promising researchers. Thanks to this subsidy, 42 Early Stage Researchers and also more experience researchers from a large variety of countries have been able to participate in the Conference. Christine Richardson (Caltech, USA) and Jirka Stradal (Utrecht University) received awards for the best 'Marie Curie Early Stage Researcher' oral and poster presentations, respectively. We have further completed and implemented the following: Early Stage Researcher's Interests Compendium, Extended Abstract Book, development of Training and Complementary Skills, Early Stage Researcher's Poster Award, Early Stage Researcher's Oral Presentation Award, Composing a Questionnaire, Evaluation of this Conference using the Questionnaire.

Data: CORDIS, © European Union

Project objective

This conference deals with a new and exciting method to deposit silicon and carbon based materials, Catalytic Chemical Vapour Deposition, or Hot Wire CVD. It is an inherently cheap, and an amazingly fast and gentle method for the deposition of amorphous and microcrystalline silicon, diamond like carbon, and carbonanotubes. The interest in this method is currently exploding worldwide. Bringing together in Europe experienced and young scientists from all over the world to interact in this exciting area will be beneficial to the thin film scientific community as a whole. Europe has the largest number of research groups that are active in this field, but advanced expertise is available overseas, in the USA and Japan. This conference will therefore be very effective, by bringing in overseas experts as well as many young researchers from Europe, including the Associated States. The conference will address the chemical deposition chemistry (including catalytic filament issues) and chemical and electronic aestivation techniques, the thin films that can be obtained consisting of silicon possessing various Nan structures, epitomical films, insulating films, and carbon-related films. In addition twill deal with the industrial implementation that is currently under study also in Europe, by demonstrating large area and economically interesting capabilities of the technique. The high deposition rate is of interest to the solar cell industry and the display industry. Also carbon annotates can be produced at high rate and conformai coverage by thin polymer layers, e.g. on biomedical applications, has been achieved. The lack of ion bombardment translates into superior surface aestivation and significant noise reduction in electronic devices. The properties of many advanced materials are based on functional layers.

Original text from CORDIS.

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Data: CORDIS, © European Union