ALD-SPUTTERING-OXIDE · Atomic layer deposition applied to synthetic carburant production and low temperature microthermal imaging. New sputtering process applied to control oxygen stoechiometry and diffusion in oxide films
FP7 — People (Marie Curie Actions)
- Duration
- 2009-10-01 → 2012-09-30
- EU contribution
- €45,000
- Participants
- 1
- Scheme
- MC-ERG
Lines connect the coordinator with its partners.
Results in brief
Atomic layer deposition ... New sputtering process applied to control oxygen stoechiometry and diffusion in oxide films
The main objective of the project is provide research opportunities of Dr Erwan Rauwel for further developing his own research skills and directions in combination with a three year researcher position at the University of Oslo (UiO). Dr Rauwel has in his project focussed on nanomaterials, synthesis and property studies. This Marie Curie (MC) project has provided stand alone results, in particular with respect to developing non-aqueous synthesis routes towards metallic nanoparticles like cobalt and nickel, however, also developing such routes towards oxide materials like hafnium oxide (HfO2) and CaHfO3. These efforts have been nicely integrated with tasks in the UiO project on sensor and imaging materials, where Dr Rauwel has worked in 1/3 position for a three year period. Luminiscence of nanoparticles have been explored with the objective to integrate these into thin films that may enhance temperature sensitivity for low-temperature thermal imaging. The atomic layer deposition (ALD) goals of Dr Rauwel in the current project, have partly been nicely interfaced with a project on coatings of mesoporous catalyst supports, a project on which Dr Rauwel has worked in 2/3 position for a period of three years. All these projects address application of nanostructured functional materials, from sensing to catalysis. The MC activities of Dr Rauwel - in combination with efforts in the other mentioned UiO projects - have led to two disclosures of invention, one of which has been passed on to the patenting stage.
Data: CORDIS, © European Union
Project objective
This project involves 3 parts, the first part relies in the improvement of the Fischer Tropsch process using atomic layer deposition (ALD) of cobalt oxide on mesoporous alumina. The improvement of this reaction is a real challenge as this process is usually used in the conversion of coal or natural gas to liquid hydrocarbons, but can be also applied to production of synthetic fuels from gasified biomass. This process is currently an area of noteworthy process research more specifically concerning the production of liquid fuel from natural gas. The second project concerns the development of a thermal imaging system based on the temperature dependence of the quantum yield of the fluorescence in certain rare-earth chelates. The main issue is to achieve high temperature sensitivity combined with high spatial resolution. This system will operate from room temperature to liquid helium temperature (4.2 K), with sensitivity of deltaT = 0.01 K. To reach these objectives, first Eu-doped organic polymer-based films will be deposited using ALD and studied. The control of the oxygen stoechiometry and diffusion during a deposition is really challenging. A new patented sputtering process allows to control these parameters. This process will be used in the last part of this project for the deposition of first dielectric thin films for transistor applications and then for new multiferroic compounds and structures deposition. This control of the oxygen stoechiometry and diffusion will allow to tune the thin films properties as it is in most of cases the key parameter. This work will be held in close collaboration with the University of Aveiro where the films will be synthesized.
Original text from CORDIS.
Participants
- UNIVERSITETET I OSLO · OsloCoordinatorNorway
Links
Data: CORDIS, © European Union